International Journal of Advances in Electrical Engineering
2023, Vol. 4, Issue 2, Part A
Self-Sovereign identity approach in oauth 2.0
Author(s): Sujeet Raosaheb Suryawanshi, Dr. Prashant B Kumbharkar and Dr. Shailesh Kumar
Abstract: Identity management, encompassing authentication and authorization within a networked environment, stands as a paramount security aspect. Over time, various identity management paradigms have evolved, progressing from the isolated silo model to the federated model and, more recently, the self-sovereign identity (SSI’) approach. Notably, SSI empowers users to autonomously oversee their own data, irrespective of organizational involvement, through the utilization of emerging blockchain technology. Numerous ongoing studies are exploring the potential of SSI.Nevertheless, SSI adoption has remained limited due to its inherent compatibility issues and user inconveniences, stemming from an unfamiliar user experience and a nascent development phase. In response, this research paper proposes a novel SSI approach rooted in blockchain technology that aligns with the widely accepted and mature OAuth 2.0 standard. This blockchain-based model ensures users’ data sovereignty, allowing them to wield control over their information in a decentralized manner, free from reliance on specific monopolistic service providers.The proposed model boasts high usability and scalability, as it can be readily embraced and implemented by users and clients familiar with existing OAuth protocols. The feasibility of the proposed model is confirmed through its implementation, accompanied by a thorough security analysis. It is anticipated that this innovative model will play a pivotal role in advancing both blockchain technology and the adoption of self-sovereign identity solutions.
DOI: 10.22271/27084574.2023.v4.i2a.44
Pages: 34-42 | Views: 459 | Downloads: 255
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How to cite this article:
Sujeet Raosaheb Suryawanshi, Dr. Prashant B Kumbharkar, Dr. Shailesh Kumar. Self-Sovereign identity approach in oauth 2.0. Int J Adv Electr Eng 2023;4(2):34-42. DOI: 10.22271/27084574.2023.v4.i2a.44
